・2012年以降の研究成果
東大生産研着任前の研究成果です.
論文やProceedingsのコピーが必要の方は遠慮なくご連絡ください.
10. | Y. Kajihara, K. Kosaka, and S. Komiyama, Passive near-field microscopy in long-wavelength infrared, e-Journal of Surface Science and Nanotechnology, 9, 173 (2011). |
9. | Y. Kajihara, K. Kosaka, and S. Komiyama, Probing thermal evanescent waves with a scattering-type near-field microscope, Meas. Sci. Tech., 22, 08510 (2011). |
8. | Y. Kajihara, K. Kosaka, and S. Komiyama, Thermally excited near-field radiation and far-field interference, Opt. Express, 19, 8, 7695 (2011). |
7. | Y. Kajihara, K. Kosaka, and S. Komiyama, A sensitive near-field microscope for thermal radiation, Rev. Sci. Instrum., 81, 3, 033706 (2010). |
6. | Y. Kajihara, K. Kosaka, and S. Komiyama, Passively detecting thermal evanescent waves from room temperature objects, Journal of Nonlinear Optical Physics & Materials, 19, 4, 589 (2010). |
5. | Y. Kajihara, S. Komiyama, P. Nickels, T. Ueda, A passive long-wavelength infrared microscope with a highly sensitive phototransistor, Rev. Sci. Instrum., 80, 6, 063702 (2009). |
4. | Y. Kajihara, Y. Inazuki, T. Takeuchi, S. Takahashi, K. Takamasu, Evanescent light photopolymerization and measurement of cure depth in nanostereolithography, Appl. Phys. Lett., 92, 9, 093120 (2008). |
3. | Y. Kajihara, T. Takeuchi, S. Takahashi, and K. Takamasu, Development of an in-process confocal positioning system for nanostereolithography using evanescent light, International Journal of Precision Engineering and Manufacturing, 9, 3, 51 (2008). |
2. | 梶原優介, 稲月友一, 高橋哲, 高増潔, エバネッセント光を利用したナノ光造形法の研究(第2報), 精密工学会誌, 73, 8, 934 (2007). |
1. | 梶原優介, 稲月友一, 高橋哲, 高増潔, エバネッセント光を利用したナノ光造形法の研究(第1報), 精密工学会誌, 72, 11, 1391 (2006). |
1. | 高橋哲, 梶原優介, 高増潔, ナノ光造形法への新しいレーザー応用技術, 成形加工, 17, 3, 161-166 (2005). |
3. | 梶原優介, THz near-field Imaging of thermally excited surface waves, 日本物理学会 2011年秋季大会シンポジウム, 走査プローブ顕微鏡の融合によるナノサイエンス, 富山大学, 9/24 (2011). |
2. | 梶原優介, テラヘルツ領域のパッシブな近接場イメージング, 第12回GRL浜松セミナー, 静岡大学, 12/17 (2010). |
1. | 梶原優介, 照射光源を使用しないテラヘルツ近接場イメージング, ナノフォトニクス総合的展開 第28回オープンセミナー, 東京大学, 10/21 (2010). |
16. | Y. Kajihara, K. Kosaka, and S. Komiyama, Probing thermal evanescent fields with a near-field microscope, IRMMW-THz 2011, Tu2D.4.1, |
15. | S. Takahashi, T. Oshima, T. Nagano, Y. Kajihara, and K. Takamasu, Dynamic Control of Lateral Evanescent Light Distribution for Microstereolithography, The 6th International Conference on MicroManufacturing, 72, 327-330, Tokyo, Japan, (2011). |
14. | S. Takahashi, T. Nagano, Y. Kajihara, and K. Takamasu, A novel exposure method based on dissolved oxygen control for nano-stereolithography using evanescent light, ASPE 2010 Annual Meeting, 373-376, Atlanta, USA, (2010). |
13. | Y. Kajihara, K. Kosaka, and S. Komiyama, Ultra-sensitive passive near-field microscopy in long-wavelength infrared region, The 6th International Workshop on Nano-scale Spectroscopy and Nanotechnology (NSS6), |
12. | Y. Kajihara, K. Kosaka, and S. Komiyama, Detecting terahertz near-field radiation without external illumination, ISMQC 2010, E5-080-1-5, |
11. | Y. Kajihara, K. Kosaka, and S. Komiyama, Passive near-field microscopy in long-wavelength infrared region, The International Conference on Nanophotonics, 147, |
10. | Y. Kajihara, S. Komiyama, and K. Kosaka, Near-field microscopy for thermal radiation, CLEO 2010, CWO6, |
9. | Y. Kajihara, S. Komiyama, K. Kosaka, P. Nickels, and T. Ueda, Passive microscopy in long-wavelength infrared region, TeraTech ‘09, 317-318, |
8. | Y. Kajihara, S. Komiyama, and K. Kosaka, Shear-force distance control for terahertz near-field microscopy, ASPEN 2009, 2A2-2-2045-p, |
7. | Y. Kajihara, S. Komiyama, P. Nickels, and T. Ueda, Passive imaging with a highly-sensitive infrared phototransistor, IRMMW-THz 2009, 09030303, Busan, Korea, (2009). |
6. | Y. Kajihara, T. Ueda, P. Nickels, and S. Komiyama, Passive terahertz microscopy with a highly sensitive detector, IMEKO XIX World Congress, 158-163, |
5. | Y. Kajihara, T. Takeuchi, S. Takahashi, and K. Takamasu, An optical and confocal microscopic system for nano-stereolithography using evanescent light, ISMTII 2007, 79-82, |
4. | S. Takahashi, M. Okuno, Y. Kajihara, and K. Takamasu, Development of laser-assisted microfabrication system for three-dimensional metal structures by photocatalysis, 7th euspen International Conference, 529-532, |
3. | Y. Kajihara, T. Takeuchi, S. Takahashi, and K. Takamasu, Development of a nano- stereolithography system using evanescent light for submicron fabrication, ASPE 2006 Annual Meeting, 39, 111-114, |
2. | S. Takahashi, Y. Inazuki, Y. Kajihara, and K. Takamasu, Photofabrication of periodic submicron structures using standing evanescent light for nano-stereolithography, ASPE 2005 Annual Meeting, 37, 371-374, |
1. | Y. Kajihara, Y. Inazuki, S. Takahashi, and K. Takamasu, Study of nano-stereolithography using evanescent light, ASPE 2004 Annual Meeting, 34, 149-152, |
1. | 高橋哲,高増潔,梶原優介,長野敏宗 光造形装置,光造形方法及び造形物 特願 2010-008356 |
2010/9 | 梶原優介, 応用物理学会講演奨励賞,第29回応用物理学会講演会 |
2010/9 | Yusuke Kajihara, Young Researcher Award, ISMQC 2010 |
2010/6 | Yusuke Kajihara, K. Kosaka, S. Komiyama Best Poster Paper Award, International Conference on Nanophotonics 2010 |
2010/3 | 梶原優介 ベストプレゼンテーション賞,2010年精密工学会春季学術講演会 |
2008/3 | 梶原優介 東京大学大学院 工学系研究科長賞 |
2008/3 | 梶原優介,稲月友一,高橋哲,高増潔 精密工学会論文賞 |