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東京大学生産技術研究所 機械・生体系部門

研究成果(-2011)publications(-2011)

2012年以降の研究成果

東大生産研着任前の研究成果です.
論文やProceedingsのコピーが必要の方は遠慮なくご連絡ください.

Original papers

10. Y. Kajihara, K. Kosaka, and S. Komiyama,
Passive near-field microscopy in long-wavelength infrared,
e-Journal of Surface Science and Nanotechnology, 9, 173 (2011).
9. Y. Kajihara, K. Kosaka, and S. Komiyama,
Probing thermal evanescent waves with a scattering-type near-field microscope,
Meas. Sci. Tech., 22, 08510 (2011).
8. Y. Kajihara, K. Kosaka, and S. Komiyama,
Thermally excited near-field radiation and far-field interference,
Opt. Express, 19, 8, 7695 (2011).
7. Y. Kajihara, K. Kosaka, and S. Komiyama,
A sensitive near-field microscope for thermal radiation,
Rev. Sci. Instrum., 81, 3, 033706 (2010).
6. Y. Kajihara, K. Kosaka, and S. Komiyama,
Passively detecting thermal evanescent waves from room temperature objects,
Journal of Nonlinear Optical Physics & Materials, 19, 4, 589 (2010).
5. Y. Kajihara, S. Komiyama, P. Nickels, T. Ueda,
A passive long-wavelength infrared microscope with a highly sensitive phototransistor,
Rev. Sci. Instrum., 80, 6, 063702 (2009).
4. Y. Kajihara, Y. Inazuki, T. Takeuchi, S. Takahashi, K. Takamasu,
Evanescent light photopolymerization and measurement of cure depth in nanostereolithography,
Appl. Phys. Lett., 92, 9, 093120 (2008).
3. Y. Kajihara, T. Takeuchi, S. Takahashi, and K. Takamasu,
Development of an in-process confocal positioning system for nanostereolithography using evanescent light,
International Journal of Precision Engineering and Manufacturing, 9, 3, 51 (2008).
2. 梶原優介, 稲月友一, 高橋哲, 高増潔,
エバネッセント光を利用したナノ光造形法の研究(第2報),
精密工学会誌, 73, 8, 934 (2007).
1. 梶原優介, 稲月友一, 高橋哲, 高増潔,
エバネッセント光を利用したナノ光造形法の研究(第1報),
精密工学会誌, 72, 11, 1391 (2006).

Review papers

1. 高橋哲, 梶原優介, 高増潔,
ナノ光造形法への新しいレーザー応用技術,
成形加工, 17, 3, 161-166 (2005).

Invited talks

3. 梶原優介,
THz near-field Imaging of thermally excited surface waves,
日本物理学会 2011年秋季大会シンポジウム, 走査プローブ顕微鏡の融合によるナノサイエンス, 富山大学, 9/24 (2011).
2. 梶原優介,
テラヘルツ領域のパッシブな近接場イメージング,
第12回GRL浜松セミナー, 静岡大学, 12/17 (2010).
1. 梶原優介,
照射光源を使用しないテラヘルツ近接場イメージング,
ナノフォトニクス総合的展開 第28回オープンセミナー, 東京大学, 10/21 (2010).

International meetings

16. Y. Kajihara, K. Kosaka, and S. Komiyama,
Probing thermal evanescent fields with a near-field microscope,
IRMMW-THz 2011, Tu2D.4.1, Houston, USA, (2011).
15. S. Takahashi, T. Oshima, T. Nagano, Y. Kajihara, and K. Takamasu,
Dynamic Control of Lateral Evanescent Light Distribution for Microstereolithography,
The 6th International Conference on MicroManufacturing, 72, 327-330, Tokyo, Japan, (2011).
14. S. Takahashi, T. Nagano, Y. Kajihara, and K. Takamasu,
A novel exposure method based on dissolved oxygen control for nano-stereolithography using evanescent light,
ASPE 2010 Annual Meeting, 373-376, Atlanta, USA, (2010).
13. Y. Kajihara, K. Kosaka, and S. Komiyama,
Ultra-sensitive passive near-field microscopy in long-wavelength infrared region,
The 6th International Workshop on Nano-scale Spectroscopy and Nanotechnology (NSS6), Kobe, Japan, (2010).
12. Y. Kajihara, K. Kosaka, and S. Komiyama,
Detecting terahertz near-field radiation without external illumination,
ISMQC 2010, E5-080-1-5, Osaka, Japan, (2010).
11. Y. Kajihara, K. Kosaka, and S. Komiyama,
Passive near-field microscopy in long-wavelength infrared region,
The International Conference on Nanophotonics, 147, Tsukuba, Japan, (2010).
10. Y. Kajihara, S. Komiyama, and K. Kosaka,
Near-field microscopy for thermal radiation,
CLEO 2010, CWO6, San Jose, USA, (2010).
9. Y. Kajihara, S. Komiyama, K. Kosaka, P. Nickels, and T. Ueda,
Passive microscopy in long-wavelength infrared region,
TeraTech ‘09, 317-318, Osaka, Japan, (2009).
8. Y. Kajihara, S. Komiyama, and K. Kosaka,
Shear-force distance control for terahertz near-field microscopy,
ASPEN 2009, 2A2-2-2045-p, Kitakyusyu, Japan, (2009).
7. Y. Kajihara, S. Komiyama, P. Nickels, and T. Ueda,
Passive imaging with a highly-sensitive infrared phototransistor,
IRMMW-THz 2009, 09030303, Busan, Korea, (2009).
6. Y. Kajihara, T. Ueda, P. Nickels, and S. Komiyama,
Passive terahertz microscopy with a highly sensitive detector,
IMEKO XIX World Congress, 158-163, Lisbon, Portugal, (2009).
5. Y. Kajihara, T. Takeuchi, S. Takahashi, and K. Takamasu,
An optical and confocal microscopic system for nano-stereolithography using evanescent light,
ISMTII 2007, 79-82, Sendai, Japan, (2007).
4. S. Takahashi, M. Okuno, Y. Kajihara, and K. Takamasu,
Development of laser-assisted microfabrication system for three-dimensional metal structures by photocatalysis,
7th euspen International Conference, 529-532, Bremen, Germany (2007).
3. Y. Kajihara, T. Takeuchi, S. Takahashi, and K. Takamasu,
Development of a nano- stereolithography system using evanescent light for submicron fabrication,
ASPE 2006 Annual Meeting, 39, 111-114, Monterey, USA, (2006).
2. S. Takahashi, Y. Inazuki, Y. Kajihara, and K. Takamasu,
Photofabrication of periodic submicron structures using standing evanescent light for nano-stereolithography,
ASPE 2005 Annual Meeting, 37, 371-374, Norfolk, USA, (2005).
1. Y. Kajihara, Y. Inazuki, S. Takahashi, and K. Takamasu,
Study of nano-stereolithography using evanescent light,
ASPE 2004 Annual Meeting, 34, 149-152, Orland, USA, (2004).

Patent

1. 高橋哲,高増潔,梶原優介,長野敏宗
光造形装置,光造形方法及び造形物
特願 2010-008356

Awards

2010/9 梶原優介,
応用物理学会講演奨励賞,第29回応用物理学会講演会
2010/9 Yusuke Kajihara,
Young Researcher Award, ISMQC 2010
2010/6 Yusuke Kajihara, K. Kosaka, S. Komiyama
Best Poster Paper Award, International Conference on Nanophotonics 2010
2010/3 梶原優介
ベストプレゼンテーション賞,2010年精密工学会春季学術講演会
2008/3 梶原優介
東京大学大学院 工学系研究科長賞
2008/3 梶原優介,稲月友一,高橋哲,高増潔
精密工学会論文賞